AMC Monitoring

Real-Time AMC Monitoring Solution for Semiconductor Manufacturing

Real-time measurements at pptv limits of detection
Simultaneous measurements of Acids (Corrosives), Bases, Condensables, and Volatile Organics
Compact design with flexible inlet configuration for FOUP QC, mobile analysis, and facility monitoring

Instantaneous reporting
Automated fast switching between reagent ions and ultra-fast polarity switching for expanded analysis
Autonomous software capable of auto-calibration, zero air measurement, and data reporting

Background

Comprehensive, Real-Time AMC Monitoring for Contamination-Free Manufacturing

The presence of airborne molecular contaminants in semiconductor fabrication plants (fabs) is a significant contributor to wafer yield loss. The continuous processing and transport of wafers (via front opening unification pods or FOUPs) in high-throughput fab facilities demands prompt feedback so that measures can be taken to minimize losses due to molecular contamination.

Contaminants originate from a wide variety of sources, including process chemicals, refrigerants, cleaning solvents, construction materials, and personnel. With the advancement of control measures in fab facilities, the need for highly sensitive technologies that can simultaneously monitor acids and bases – compounds which are often sticky and prone to reaction – has grown, in addition to traditional condensables and volatiles like acetone, MEK, PGME, PGMEA, CNF, COF, etc. To effectively measure these compounds, real-time, full-spectrum analysis with sub-ppt limits of detection is required.

The TOFWERK Semicon AMC Monitor provides robust monitoring and comprehensive AMC coverage in semiconductor facilities. Unprecedented mobility enables proximity measurements of acids (corrosives), bases, condensables, and VOCs. Customizable sampling configurations allow for easy integration into FOUP QC and facility monitoring systems. The flexibility and performance of the TOFWERK Semicon AMC Solution enables fab facilities to reach and maintain a contamination-free fab.

Solutions

The TOFWERK Semicon AMC Solution for Simultaneous, Real-Time AMC Monitoring for Acids (Corrosives), Bases, and Condensables

The Semicon AMC Monitor provides sensitive and simultaneous measurements for each molecular category – acids (Corrosives), bases, condensables and VOCs – instantaneously, in real time, without any sample preparation or handling.
- Ultra-fast measurements (milliseconds)
- Ideal for dynamic processes or high-throughput screening
- Simultaneous detection of critical AMC classes
- Highly sensitive quantification
- pptV limits of detection
- Robust, accurate, and reliable detection and identification
- Mobile analysis or multi-port facility monitoring without sample preparation
Semicon AMC Solution Page
Detecting Micro Contamination in FOUPs: Using proprietary Fast Polarity Switching (FPS), each AMC class is simultaneously measured and reported.

(Top panel) Toluene and PGMEA are contaminants are introduced and purged away using nitrogen. Trace acetic acid is then introduced and purged. Finally, two small pulses of Ammonia DMA and TMA are removed at a much faster rate because the reaction between the bases and the trace nitric acid result in particle formation. (Bottom panel) Fast Polarity Switching measurements are observed. FPS allows each compound class to be measured in real time, ensuring that transient signals are not missed.