High-Resolution Depth Profile by fs-LA – Inductively Coupled Plasma – Mass Spectrometry

Depth profile analyses with sub 100-nm depth resolution of a metal thin film by femtosecond - laser ablation - inductively coupled plasma - time-of-flight mass spectrometry

Depth Profile Analyses with Sub 100-nm Depth Resolution of a Metal Thin Film by Femtosecond – Laser Ablation – Inductively Coupled Plasma – Time-of-Flight Mass Spectrometry

Debora Käser, Lyndsey Hendriks, Joachim Koch, Detlef Günther
Spectrochimica Acta Part B: Atomic Spectroscopy, 2018
DOI:10.1016/j.sab.2018.08.002

In this publication, Debora Käser and coworkers demonstrate an innovative way to achieve a homogenized beam from a femtosecond laser beam in a laser ablation/ icpTOF prototype system.  This homogenization scheme leads to uniform ablation within the laser spot and to improved depth resolution of laser ablation – inductively coupled plasma – time-of-flight mass spectrometry (LA-ICP-TOFMS).

When analyzing the depth profile of a Cr/Ni metal thin film, the depth resolution was found to be better than 100 nm. This resolution suggests LA-ICP-TOFMS could be a complementary technology to secondary ion mass spectrometry or glow discharge optical emission spectrometry for depth profiling due to its higher speed and lateral resolution in combination with high sensitivity.

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