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Join TOFWERK at HiPIMS 2024

TOFWERK is excited to participate in this year’s HiPIMS workshop from March 11 – 13, 2024. This workshop, held on an online platform, will address recent developments of high-power impulse magnetron sputtering (HiPIMS). It will provide a networking environment with oral presentations, poster presentations and exhibits. The virtual platform will allow you to interact with the invited speakers and participants of the workshop.

HiPIMS Virtual Booth Presentation

March 13
6:50 – 7:00 AM UTC
Talk: Energy-Resolved Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis, Dr. Patrick Sturm, TOFWERK

Please see the full program for workshop details and schedule.

For joining us, please register at the link.

Highlighted Solutions at HiPIMS 2024

Semiconductor AMC Solutions

Ultra fast. Ultra sensitive. Our AMC Monitoring Solutions allow you to monitor known and emerging contaminants from diverse molecular categories in real time. AMC Monitoring provides robust and simultaneous measurements of multiple AMC categories using fast-switching, highly sensitive time-of-flight chemical ionization mass spectrometry. 

Semiconductor Process Solutions

With a rugged and flexible configuration, our Process Monitoring Solutions use electron ionization time-of-flight mass spectrometry to simultaneously detect and analyze all precursors, byproducts, and trace species in real time. Equipped with powerful, high-speed software, our process analyzers are designed to handle challenging process requirements and enable fast, non-intrusive detection of process deviations in semiconductor processes. 

Contact sales@tofwerk.com for queries.