{"id":27557,"date":"2021-11-17T12:56:49","date_gmt":"2021-11-17T19:56:49","guid":{"rendered":"https:\/\/www.tofwerk.com\/?p=27557"},"modified":"2024-08-09T06:55:03","modified_gmt":"2024-08-09T12:55:03","slug":"monitoring-atomic-layer-deposition-processes","status":"publish","type":"post","link":"https:\/\/www.tofwerk.com\/ko\/monitoring-atomic-layer-deposition-processes\/","title":{"rendered":"Semicon Process \uc194\ub8e8\uc158\uc744 \uc0ac\uc6a9\ud55c \uc6d0\uc790\uce35 \uc99d\ucc29 \uacf5\uc815\uc758 \ubaa8\ub2c8\ud130\ub9c1 \ubc0f \ud2b9\uc131\ud654"},"content":{"rendered":"

\ubca4 \ubca4\uc0ac\uc6b8\ub77c
TOFWERK \uc2a4\uc704\uc2a4<\/p>\n\n\n\n

\uc18c\uac1c<\/h2>\n\n\n\n

\uc6d0\uc790\uce35 \uc99d\ucc29(ALD)\uc740 \ub2e4\uc591\ud55c \ubc15\ub9c9 \uc7ac\ub8cc\uc5d0 \ub300\ud55c \ud45c\uc900 \uae30\uc220\ub85c \ube60\ub974\uac8c \uc790\ub9ac \uc7a1\uace0 \uc788\uc73c\uba70 \ubc18\ub3c4\uccb4 \ubd84\uc57c\uc5d0\uc11c \ud544\uc218\uc801\uc778 \ub3c4\uad6c\uc785\ub2c8\ub2e4. ALD\ub294 \ubcf5\uc7a1\ud55c 3D \ud615\uc0c1\uc744 \uac00\uc9c4 \uae30\ud310\uc5d0\uc11c\ub3c4 \ubc15\ub9c9\uc758 \ub450\uaed8\uc640 \uc801\ud569\uc131\uc744 \ub098\ub178\ubbf8\ud130 \uc774\ud558\ub85c \uc81c\uc5b4\ud558\uae30 \uc704\ud574 \ub450 \uac00\uc9c0 \uae30\uccb4 \ubc18\uc751\ubb3c\uc758 \uc790\uae30 \uc81c\ud55c\uc801 \ud45c\uba74 \ubc18\uc751\uc744 \uc21c\ucc28\uc801\uc73c\ub85c \uc0ac\uc6a9\ud569\ub2c8\ub2e4. \uc99d\ucc29\ub41c \ud544\ub984\uc758 \ubb3c\ub9ac\ud654\ud559\uc801 \ud2b9\uc131\uc740 \uc8fc\ub85c \ud45c\uba74 \ubd84\ud574 \ubc18\uc751\uacfc \uc131\uc7a5 \uba54\ucee4\ub2c8\uc998\uc5d0 \ub530\ub77c \ub2ec\ub77c\uc9d1\ub2c8\ub2e4. \ub530\ub77c\uc11c \uc774\ub7ec\ud55c \uacf5\uc815\uc744 \uc644\uc804\ud788 \ud2b9\uc131\ud654\ud558\uace0 \uc774\ud574\ud558\ub294 \uac83\uc774 \uc911\uc694\ud558\uba70, \uacf5\uc815 \ucd5c\uc801\ud654 \uc8fc\uae30\ub97c \ub2e8\ucd95\ud558\uace0 \uc0dd\uc0b0 \ud658\uacbd\uc5d0\uc11c \uc2e4\uc2dc\uac04 \ubaa8\ub2c8\ud130\ub9c1 \ubc0f \uc81c\uc5b4\ub97c \uc81c\uacf5\ud558\ub294 \uacc4\uce21 \ud234\uc744 \ud65c\uc6a9\ud558\ub294 \uac83\uc774 \uc911\uc694\ud569\ub2c8\ub2e4.<\/p>\n\n\n\n

ALD\ub97c \uc704\ud55c Semicon Process \uc194\ub8e8\uc158<\/h2>\n\n\n\n

\uc774 \uc560\ud50c\ub9ac\ucf00\uc774\uc158 \ub178\ud2b8\uc5d0\uc11c\ub294 \ubc15\ub9c9 \uc81c\uc870 \uacf5\uc815\uc758 \uc2e4\uc2dc\uac04 \ubaa8\ub2c8\ud130\ub9c1\uc744 \uc704\ud574 \uc6d0\uc790\uce35 \uc99d\ucc29 \uc2dc\uc2a4\ud15c(SC-1, \uc2a4\uc704\uc2a4 \ud230\uc758 Swiss Cluster AG)\uc5d0 TOFWERK Semicon Process \uc194\ub8e8\uc158\uc744 \ud1b5\ud569\ud558\ub294 \ubc29\ubc95\uc744 \uc18c\uac1c\ud569\ub2c8\ub2e4. Semicon Process \ubd84\uc11d\uae30\ub294 \ub3d9\uc704\uc6d0\uc18c \ubd84\ud574\ub2a5\uc774 10% \uc774\uc0c1\uc778 \ubaa8\ub4e0 \uc774\uc628\ud654\ub41c \ubd84\uc790\ub97c \ub3d9\uc2dc\uc5d0 \uac10\uc9c0\ud569\ub2c8\ub2e4.5<\/sup> \ub3d9\uc801 \ubc94\uc704 \ubc0f \ucd5c\ub300 1kHz\uc758 \uc9c8\ub7c9 \uc2a4\ud399\ud2b8\ub7fc \uc218\uc9d1 \uc18d\ub3c4\ub97c \uc9c0\uc6d0\ud569\ub2c8\ub2e4. \ud654\ud559 \ub370\uc774\ud130 \uc218\uc9d1\uc774 \ud604\uc7a5\uc5d0\uc11c \uc774\ub8e8\uc5b4\uc9c0\uae30 \ub54c\ubb38\uc5d0 \uc801\uc6a9\ub41c \uc99d\ucc29 \ud30c\ub77c\ubbf8\ud130\uc758 \uacb0\uacfc\ub97c \uc989\uc2dc \ubaa8\ub2c8\ud130\ub9c1\ud560 \uc218 \uc788\uc5b4 \uc628\ub3c4 \ubc0f \ud384\uc2f1\/\ud37c\uc9d5 \uc2dc\uac04\uacfc \uac19\uc740 \uacf5\uc815 \uc2e4\ud5d8 \uc870\uac74\uc744 \uc989\uc2dc \uc218\uc815\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4. \ub610\ud55c \ucd5c\uc801\uc758 \uc870\uac74\uc5d0\uc11c \ubc97\uc5b4\ub09c \uacf5\uc815 \uc774\ud0c8\uc774\ub098 \uc7a5\ube44 \uc624\uc791\ub3d9\ub3c4 \uac10\uc9c0\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4. Semicon Process \ubd84\uc11d\uae30\ub97c \uc0ac\uc6a9\ud55c \uc774\ub7ec\ud55c \ud604\uc7a5 \uc218\uc9d1\uc740 \uc0c1\ub2f9\ud55c \uc9c0\uc5f0\uc774 \ubc1c\uc0dd\ud558\ub294 \uc0ac\ud6c4(\ud604\uc7a5) \ud654\ud559 \ubc0f \uad6c\uc870 \ud2b9\uc131\ud654 \ubc29\ubc95\uc5d0 \ube44\ud574 \ud070 \uc7a5\uc810\uc774 \uc788\uc2b5\ub2c8\ub2e4.<\/p>\n\n\n\n

\uc2e4\ud5d8 \uc124\uc815<\/h2>\n\n\n\n

ALD \uacf5\uc815\uc740 ALD\uc640 PVD\ub97c \uacb0\ud569\ud55c \uc0c8\ub85c\uc6b4 \uc18c\ud615 \ud074\ub7ec\uc2a4\ud130 \uc2dc\uc2a4\ud15c\uc778 SC-1\uc744 \uc0ac\uc6a9\ud558\uc5ec \uc218\ud589\ub418\uc5c8\uc2b5\ub2c8\ub2e4. \uc774 \uc5f0\uad6c\uc5d0\uc11c\ub294 SC-1\uc758 ALD \ubaa8\ub4c8\ub9cc \uc0ac\uc6a9\ud588\uc2b5\ub2c8\ub2e4. \uae30\ud310 \uc628\ub3c4\ub294 120\u00b0C\ub85c \uc124\uc815\ud588\uc2b5\ub2c8\ub2e4. \ud2b8\ub9ac\uba54\ud2f8\uc54c\ub8e8\ubbf8\ub284, Al(CH3<\/sub>)3<\/sub> (TMA, 98 % \uc21c\ub3c4, Strem \uc81c\uacf5) \ubc0f DI H2<\/sub>O\uac00 \uc0ac\uc6a9\ub418\uc5c8\uc2b5\ub2c8\ub2e4. \uc774 \ub450 \uac00\uc9c0 \uac00\uc2a4 \uc804\uad6c\uccb4\ub294 \uc77c\ubc18\uc801\uc73c\ub85c Al2<\/sub>O3<\/sub>, \ubaa8\ub378 ALD \uc2dc\uc2a4\ud15c\uc785\ub2c8\ub2e4. \uc774 \uacf5\uc815\uc758 \ud654\ud559\uc801 \ud2b9\uc131\uc740 \uc218\ub9ce\uc740 \uc5f0\uad6c\uc5d0\uc11c \uad11\ubc94\uc704\ud558\uac8c \ubd84\uc11d\ub418\uc5c8\uc73c\uba70 \uc774 \uc5f0\uad6c\uc5d0\uc11c \uc81c\uc2dc\ub41c \uacb0\uacfc\ub97c \ud3c9\uac00\ud558\ub294 \ub370 \uc0ac\uc6a9\ub418\uc5c8\uc2b5\ub2c8\ub2e4. \ub450 \uc804\uad6c\uccb4\ub294 \uc2e4\uc628\uc5d0\uc11c \uc99d\ucc29 \ucc54\ubc84\ub85c \uc804\ub2ec\ub418\uc5c8\uace0 \uc21c\ub3c4 99.9995% \uc544\ub974\uace4(\uc5d0\uc5b4\ub9ac\ud034\ub4dc \uacf5\uae09)\uc774 \ud37c\uc9d5 \uac00\uc2a4\ub85c \uc0ac\uc6a9\ub418\uc5c8\uc2b5\ub2c8\ub2e4.<\/p>\n\n\n\n

\uc2e4\ud5d8\uc740 20\ubc88\uc758 ALD \uc8fc\uae30\ub85c \uad6c\uc131\ub418\uc5c8\uc2b5\ub2c8\ub2e4. \uac01 \uc0ac\uc774\ud074\uc5d0\ub294 50\ubc00\ub9ac\ucd08\uc758 TMA \ud384\uc2a4\uc640 30\ubc00\ub9ac\ucd08\uc758 H2<\/sub>O\ub97c \uc0ac\uc6a9\ud558\uc5ec \uad00\uc2ec \uac00\uc2a4\ub9cc \ucc54\ubc84\ub85c \uc720\uc785\ub418\ub3c4\ub85d \ud588\uc2b5\ub2c8\ub2e4. \uac00\uc2a4 \uc804\uad6c\uccb4 \ud384\uc2a4 \uc0ac\uc774\uc5d0 30\ucd08 \ub3d9\uc548 50ccm\uc758 \uc544\ub974\uace4 \uac00\uc2a4 \ud37c\uc9c0\uac00 \uc81c\uacf5\ub418\uc5c8\uc2b5\ub2c8\ub2e4.<\/p>\n\n\n\n

\uacb0\uacfc<\/h2>\n\n\n\n

ALD\uc5d0\uc11c\ub294 \uc21c\ucc28\uc801\uc73c\ub85c \ub3c4\uc785\ub41c \uac00\uc2a4 \uc804\uad6c\uccb4\uc640 \ud45c\uba74 \uc0ac\uc774\uc758 \ubc18\uc751\uc73c\ub85c \uc778\ud574 \uadf8\ub9bc 1\uc5d0 \uc124\uba85\ub41c \ub300\ub85c \ubd80\uc0b0\ubb3c\uc774 \ubc29\ucd9c\ub429\ub2c8\ub2e4. \uc774\ub7ec\ud55c \ubd80\uc0b0\ubb3c\uc758 \ud654\ud559\uc801 \ud2b9\uc131\uacfc \uc591\uc740 \uadfc\ubcf8\uc801\uc778 \ubc18\uc751 \uba54\ucee4\ub2c8\uc998\uc5d0 \ub300\ud55c \uc911\uc694\ud55c \uc815\ubcf4\ub97c \uc81c\uacf5\ud558\uace0 \uc0b0\uc5c5 \uaddc\ubaa8\uc5d0\uc11c \uc548\uc815\uc801\uc774\uace0 \uc7ac\ud604 \uac00\ub2a5\ud55c \ud504\ub85c\uc138\uc2a4\ub97c \uc704\ud55c \ubaa8\ub2c8\ud130\ub9c1 \ud504\ub85c\ud1a0\ucf5c\uc744 \uac1c\ubc1c\ud558\ub294 \ub370 \ud1b5\ucc30\ub825\uc744 \uc81c\uacf5\ud569\ub2c8\ub2e4.<\/p>\n\n\n

\n
\"\"<\/a>
\uadf8\ub9bc 1.<\/strong> \uc99d\ucc29 \uacf5\uc815\uacfc \uadf8 \uacf5\uc815\uc5d0 \uad00\ub828\ub41c \ubaa8\ub4e0 \ubd84\uc790\uc758 \ubcd1\ub82c \uac80\ucd9c\uc5d0 \ub300\ud55c \uac1c\ub7b5\uc801\uc778 \uadf8\ub9bc. \uc608\ub97c \ub4e4\uc5b4 TMA+H2<\/sub>O<\/em><\/em> \uc99d\ucc29, TMA\ub294 \ud45c\uba74\uc5d0\uc11c OH \ubd80\uc704\uc640 \ubc18\uc751\ud558\uc5ec CH4<\/sub>, \ub85c \uc124\uc815\ud558\uace0, \ud37c\uc9d5 \ub2e8\uacc4 \ud6c4 H2<\/sub>O\ub294 \uba54\ud2f8 \ud45c\uba74\uacfc \ubc18\uc751\ud558\uc5ec \uc8fc\ub85c CH4<\/sub> \uc640 \uac19\uc740 2\ucc28 \uc81c\ud488 \uc678\uc5d0\ub3c4 AlOH(CH3<\/sub>)2<\/sub>.<\/em><\/figcaption><\/figure>\n<\/div>\n\n\n

\uc6b0\ub9ac\ub294 Al2<\/sub>O3  <\/sub>TMA \ubc0f H\ub97c \uc0ac\uc6a9\ud55c \uc99d\ucc292<\/sub>O\ub294 \uc8fc\ub85c \ub2e4\uc74c\uc5d0\uc11c \uce21\uc815\ub41c \uc2e0\ud638 \ubd84\ud3ec\ub97c \uae30\ubc18\uc73c\ub85c \ud2b9\uc131\ud654\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4. m\/Q <\/em>= 16 Th, 18 Th, 27 Th, 40 Th\uc5d0 \ud574\ub2f9\ud558\uba70, TMA Al(27 Th), H2<\/sub>O (18 \uc77c), \ubd80\uc0b0\ubb3c CH4<\/sub> (16 Th)\uc640 \uc544\ub974\uace4 \uc6b4\ubc18 \uae30\uccb4(40 Th). \uadf8\ub7ec\ub098 \uadf8\ub9bc 2\uc640 \uac19\uc774 \ubaa8\ub4e0 \uc9c8\ub7c9\uc744 \ub3d9\uc2dc\uc5d0 \uac10\uc9c0\ud560 \uc218 \uc788\ub294 \uae30\ub2a5 \ub355\ubd84\uc5d0 \uc774\uc804\uc5d0\ub294 \uac10\uc9c0\ub418\uc9c0 \uc54a\uc558\ub358 \ucd94\uac00 \ubd80\uc0b0\ubb3c\uc744 \uad00\ucc30\ud560 \uc218 \uc788\uc5c8\uc73c\uba70, Semicon Process \ubd84\uc11d\uae30\uc758 \ub192\uc740 \uc9c8\ub7c9 \ubd84\ud574\ub2a5\uacfc \uc815\ud655\ub3c4\uac00 \uc5c6\uc5c8\ub2e4\uba74 \uc2dd\ubcc4\ud558\uae30 \uc5b4\ub824\uc6e0\uc744 \uac83\uc785\ub2c8\ub2e4.<\/p>\n\n\n

\n
\"\"<\/a>
\uadf8\ub9bc 2. <\/strong>20\ubc88\uc758 \uc5f0\uc18d\uc801\uc778 TMA \ubc0f H2O \uc8fc\uae30\ub85c \uad6c\uc131\ub41c \uc804\uccb4 ALD \uacf5\uc815 \ub3d9\uc548 \ud68d\ub4dd\ud55c \uc9c8\ub7c9 \uc2a4\ud399\ud2b8\ub7fc: a) \uc804\uccb4 \uc9c8\ub7c9 \uc2a4\ud399\ud2b8\ub7fc: m\/Q < 290 Th\uc778 \uacf5\uc815 \ubc18\uc751\ubb3c\uc758 \uacbd\uc6b0 \uac00\uc7a5 \uac15\ud55c \uc2e0\ud638\uac00 \uad00\ucc30\ub418\uc5c8\uc9c0\ub9cc \ub354 \ubb34\uac70\uc6b4 \uc774\uc628\ub3c4 \uac80\ucd9c\ub418\uc5c8\uace0, b) \uc7a0\uc7ac \ubc18\uc751 \uae30\uc9c8 \ubc0f \ubd80\uc0b0\ubb3c\uc774 \uc9c0\uc815\ub41c \uc9c8\ub7c9 \uc2a4\ud399\ud2b8\ub7fc\uc758 \uc77c\ubd80 \uc601\uc5ed\uc774 \uac80\ucd9c\ub418\uc5c8\uc2b5\ub2c8\ub2e4. \ub85c\uadf8 \uc2a4\ucf00\uc77c\uc5d0 \uc720\uc758\ud558\uc138\uc694.<\/em><\/figcaption><\/figure>\n<\/div>\n\n\n

Semicon Process \uc194\ub8e8\uc158\uc774 \uc81c\uacf5\ud558\ub294 \ub610 \ub2e4\ub978 \uc911\uc694\ud55c \uae30\ub2a5\uc740 \uadf8\ub9bc 3\uc5d0\uc11c \ubcfc \uc218 \uc788\ub4ef\uc774 \uc6d0\uc790\ub85c\uc5d0 \uc874\uc7ac\ud558\ub294 \ubaa8\ub4e0 \uc885\uc758 \uc2dc\uac04 \ubcc0\ud654\ub97c \ubaa8\ub2c8\ud130\ub9c1\ud560 \uc218 \uc788\ub294 \uae30\ub2a5\uc785\ub2c8\ub2e4. \uadf8\ub9bc 4\ub294 \uce21\uc815\ub41c \ud2b9\uc131 \uac12\uc744 \ubcf4\uc5ec\uc90d\ub2c8\ub2e4. 27<\/sup>Al \uc2e0\ud638 \ubd84\ud3ec, \uc989 27<\/sup>TMA \ubc38\ube0c\uac00 \uc5f4\ub824 \uc788\uc744 \ub54c\uc758 Al \uc2e0\ud638 \ud53c\ud06c \uc9c4\ud3ed\uacfc \ucd5c\ub300 \uc808\ubc18(FWHM)\uc758 \uc804\uccb4 \ud3ed\uc785\ub2c8\ub2e4. \uc774 \ub450 \uac12\uc758 \ubcc0\ud654\ub294 \uc0ac\uc774\ud074\ub9c8\ub2e4 \uc804\ub2ec\ub418\ub294 TMA\uc758 \uc591\uc774 \ub2ec\ub77c\uc84c\uc74c\uc744 \ub098\ud0c0\ub0c5\ub2c8\ub2e4. ALD \uacf5\uc815\uc740 \uc790\uccb4 \uc81c\ud55c\uc774 \uc788\uace0 TMA \uc804\uad6c\uccb4\uc758 \uacfc\uc789\uc774 \uce35 \ub450\uaed8\uc758 \uc99d\uac00\ub97c \uc720\ub3c4\ud558\uc9c0\ub294 \uc54a\uc9c0\ub9cc \uc804\uad6c\uccb4 \uc18c\ube44\ub97c \ucd5c\uc801\ud654\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4. \ubc18\ub300\ub85c \uc804\uad6c\uccb4 \uc591\uc774 \uc801\uc73c\uba74 \ubd80\ubd84\uc801\uc778 \ub2e8\uce35 \uc99d\ucc29\uc774 \ubc1c\uc0dd\ud558\uace0 \uc774\uc885 \uad6c\uc870\uc758 \uc99d\ucc29\uc774 \ubaa9\ud45c\uc778 \uacbd\uc6b0 \ud45c\uba74 \ud615\ud0dc\uac00 \uac70\uce60\uc5b4\uc9c0\uace0 \uc778\ud130\ud398\uc774\uc2a4\uac00 \uc774\uc0c1\uc801\uc774\uc9c0 \uc54a\uac8c \ub429\ub2c8\ub2e4. \ub530\ub77c\uc11c Semicon Process \ubd84\uc11d\uae30\ub97c \ud1b5\ud574 \uac00\ub2a5\ud55c \uc0ac\uc774\ud074 \uac04 ALD \uacf5\uc815 \uc7ac\ud604\uc131\uc758 \uc2e4\uc2dc\uac04 \uc815\ub7c9\ud654\ub294 \uacf5\uc815 \ucd5c\uc801\ud654(R&D)\uc640 \uc0dd\uc0b0 \ubaa8\ub450\uc5d0\uc11c \uc911\uc694\ud569\ub2c8\ub2e4.<\/p>\n\n\n

\n
\"\"<\/a>
\uadf8\ub9bc 3.<\/strong> ALD \ucc54\ubc84 \ub0b4\uc5d0 \ud1b5\ud569\ub41c \ud604\uc7a5 Semicon Process \ubd84\uc11d\uae30\ub294 \uc81c\ud488 \ubc0f \ubd80\uc0b0\ubb3c\uc744 \ud3ec\ud568\ud558\uc5ec ALD \uacf5\uc815\uc5d0 \ucc38\uc5ec\ud558\ub294 \ubaa8\ub4e0 \uc6d0\uc18c \ubc0f \ubd84\uc790\uc758 \uc2dc\uac04 \ubcc0\ud654\ub97c \ubaa8\ub2c8\ud130\ub9c1\ud560 \uc218 \uc788\ub294 \ud2b9\ubcc4\ud55c \uae30\ud68c\ub97c \uc81c\uacf5\ud569\ub2c8\ub2e4. H2O(\ud30c\ub780\uc0c9 \uc120) \ubc0f Al(\ube68\uac04\uc0c9 \uc120) \uc2e0\ud638\ub294 \uac00\uc2a4 \uc804\uad6c\uccb4\ub97c \ub098\ud0c0\ub0b4\uace0, N(\ub179\uc0c9 \uc120) \ubc0f Ar(\ubcf4\ub77c\uc0c9 \uc120) \uc2e0\ud638\ub294 \uc99d\ucc29 \ucc54\ubc84\uc758 \uc9c4\uacf5 \uc0c1\ud0dc\uc5d0 \ub300\ud55c \uc815\ubcf4\ub97c \uc81c\uacf5\ud569\ub2c8\ub2e4. 20\uc8fc\uae30 \uc99d\ucc29 \uacf5\uc815\uc758 \uc2dc\uac04 \ubcc0\ud654(a)\uc640 \ucc98\uc74c \uc138 TMA \ubc0f H2O \uc0ac\uc774\ud074\uc758 \ubc30\uc728(b)\uc774 \ud45c\uc2dc\ub418\uc5b4 \uc788\uc2b5\ub2c8\ub2e4. \ub354 \ub098\uc740 \uc2dc\uac01\ud654\ub97c \uc704\ud574 pgaTOF \ub370\uc774\ud130\ub97c 1\ub85c \uc815\uaddc\ud654\ud588\uc2b5\ub2c8\ub2e4.<\/em><\/figcaption><\/figure>\n<\/div>\n\n
\n
\"\"<\/a>
\uadf8\ub9bc 4.<\/strong> \uc5f0\uc18d\uc801\uc778 TMA \uc8fc\uc785 \uc911\uc5d0 \uce21\uc815\ub41c Al \uc2e0\ud638 \ud53c\ud06c\uc758 \ube44\uad50. \ud53c\ud06c \ub192\uc774(SAl,max,height@TMA) \ubc0f \ud3ed(SAl,max,width@TMA) \uac12\uc758 \ubcc0\ud654\ub294 \uc804\ub2ec\ub41c \uac00\uc2a4 \uc804\uad6c\uccb4\uc758 \ubcc0\ud654\ub7c9\uc744 \ub098\ud0c0\ub0b4\uba70, \ub530\ub77c\uc11c \uc0ac\uc774\ud074 \uac04 ALD \uacf5\uc815 \uc7ac\ud604\uc131\uc744 \uc81c\uacf5\ud569\ub2c8\ub2e4.<\/em><\/figcaption><\/figure>\n<\/div>\n\n\n

\uacb0\ub860<\/h2>\n\n\n\n

\uc774 \uc560\ud50c\ub9ac\ucf00\uc774\uc158 \ub178\ud2b8\uc5d0 \uc81c\uc2dc\ub41c \ubc14\uc640 \uac19\uc774 Semicon Process \ubd84\uc11d\uae30\ub97c ALD \uc2dc\uc2a4\ud15c \ub0b4\uc5d0 \ud1b5\ud569\ud558\uba74 \ubaa8\ub4e0 \uc774\uc628\ud654\ub41c \ubd84\uc790\uc640 \uc870\uac01\uc744 \uc2e4\uc2dc\uac04\uc73c\ub85c \ub3d9\uc2dc\uc5d0 \uac10\uc9c0\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4. \ub530\ub77c\uc11c \ucd5c\uc801\uc758 \uacf5\uc815 \ud3b8\ucc28 \ub610\ub294 \uc624\uc791\ub3d9\uc744 \uc870\uae30\uc5d0 \uac10\uc9c0\ud560 \uc218 \uc788\uc73c\uba70, \uacb0\uacfc\uc801\uc73c\ub85c \uc804\uad6c\uccb4 \uc628\ub3c4, \ud384\uc2a4 \uc9c0\uc18d \uc2dc\uac04, \uc555\ub825 \ub4f1\uc758 \uc99d\ucc29 \ud30c\ub77c\ubbf8\ud130\ub97c \uc989\uc2dc \uc218\uc815\ud558\uc5ec \uc758\ub3c4\ud55c \ubc15\ub9c9 \ud654\ud559 \uad6c\uc870\uc758 \uc99d\ucc29\uc744 \ubcf4\uc7a5\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4.<\/p>\n\n\n\n

ALD \uacf5\uc815\uc744 \uc704\ud55c \ud604\uc7a5 Semicon Process \uc194\ub8e8\uc158\uc758 \uc7a5\uc810\uc740 \ud654\ud559 \uae30\uc0c1 \uc99d\ucc29\uacfc \uac19\uc740 \ub2e4\ub978 \uc99d\ucc29 \uae30\uc220\uacfc \uacf5\uc815 \ucd5c\uc801\ud654, \ubaa8\ub2c8\ud130\ub9c1 \ubc0f \uc81c\uc5b4\ub97c \uc704\ud55c \uc2dd\uac01 \uc751\uc6a9 \ubd84\uc57c\ub85c \ud655\uc7a5\ub420 \uac83\uc785\ub2c8\ub2e4. \uc5d4\ub4dc\ud3ec\uc778\ud2b8 \uac10\uc9c0\ub294 2\uc6d0, 3\uc6d0, 4\uc6d0 \ud569\uae08\uc744 \ud3ec\ud568\ud558\ub294 \uc804\uc774\uc640 \uac19\uc740 \ubcf5\uc7a1\ud55c \uc778\ud130\ud398\uc774\uc2a4\uc5d0 \ub300\ud574 \uad6c\ud604\ub420 \uc218 \uc788\uc2b5\ub2c8\ub2e4. \ub610\ud55c \ube60\ub978 \ud68d\ub4dd \uc18d\ub3c4\ub294 \ud384\uc2a4 \ubaa8\ub4dc\uc5d0\uc11c \uc791\ub3d9\ud558\ub294 \uc18c\uc2a4\uc640 \ub098\ub178\uce35 \uc2a4\ud0dd\uc758 \uc99d\ucc29 \ubc0f \uc2dd\uac01\uacfc \uad00\ub828\ub41c \uacf5\uc815\uc5d0 \ub9e4\uc6b0 \uc911\uc694\ud569\ub2c8\ub2e4. Semicon Process \uc194\ub8e8\uc158\uc740 \ubcf5\uc7a1\ud55c \uac00\uc2a4 \ud658\uacbd\uc758 \ud654\ud559 \uc885\uc744 \uc815\ud655\ud558\uac8c \ud560\ub2f9\ud558\uace0 \uc2dc\uac04 \ubcc0\ud654\ub97c \uce21\uc815\ud574\uc57c \ud558\ub294 \ub2e4\ub978 \ubc18\ub3c4\uccb4 \uacf5\uc815\uc758 \ubaa8\ub2c8\ud130\ub9c1 \ub3c4\uad6c\ub85c \uad11\ubc94\uc704\ud558\uac8c \uc801\uc6a9\ub420 \uc218 \uc788\uc2b5\ub2c8\ub2e4.   <\/p>\n\n\n\n

\uc2b9\uc778
<\/strong>\uc774 \uc560\ud50c\ub9ac\ucf00\uc774\uc158 \ub178\ud2b8\uc5d0 \ub370\uc774\ud130 \uc218\uc9d1 \ubc0f \ubd84\uc11d\uc5d0 \uae30\uc5ec\ud574 \uc8fc\uc2e0 EMPA Eidg(\ud230)\uacfc \uc2a4\uc704\uc2a4 \ud074\ub7ec\uc2a4\ud130(\ud230)\uc5d0 \uac10\uc0ac\uc758 \ub9d0\uc500\uc744 \uc804\ud569\ub2c8\ub2e4.<\/p>","protected":false},"excerpt":{"rendered":"

Ben BensaoulaTOFWERK Switzerland Introduction Atomic layer deposition (ALD) is rapidly becoming a standard technique for a wide range of thin film materials and is an essential tool in the semiconductor sector. ALD relies on self-limiting surface reactions of two gaseous reactants in sequential mode to obtain sub-nanometer control of the thickness and conformity of a … \ub354 \uc77d\uae30<\/a><\/p>","protected":false},"author":3,"featured_media":27576,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[118],"tags":[],"product_notes":[345],"class_list":["post-27557","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-application-note","product_notes-semicon-process"],"acf":[],"yoast_head":"\nMonitoring and Characterization of Atomic Layer Deposition Processes<\/title>\n<meta name=\"description\" content=\"Incorporating ClearFab Process Solutions within an atomic layer deposition system allows for simultaneous, real-time detection of all ionized molecules and fragments.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.tofwerk.com\/ko\/monitoring-atomic-layer-deposition-processes\/\" \/>\n<meta property=\"og:locale\" content=\"ko_KR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Monitoring and Characterization of Atomic Layer Deposition Processes\" \/>\n<meta property=\"og:description\" content=\"Incorporating ClearFab Process Solutions within an atomic layer deposition system allows for simultaneous, real-time detection of all ionized molecules and fragments.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.tofwerk.com\/ko\/monitoring-atomic-layer-deposition-processes\/\" \/>\n<meta property=\"og:site_name\" content=\"TOFWERK\" \/>\n<meta property=\"article:publisher\" content=\"https:\/\/www.facebook.com\/Tofwerk-AG-132696640122705\/\" \/>\n<meta property=\"article:published_time\" content=\"2021-11-17T19:56:49+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2024-08-09T12:55:03+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.tofwerk.com\/wp-content\/uploads\/Atomic-Layer-Deposition-App-Note-2.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"1200\" \/>\n\t<meta property=\"og:image:height\" content=\"630\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"author\" content=\"Kendra\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:creator\" content=\"@tofwerker\" \/>\n<meta name=\"twitter:site\" content=\"@tofwerker\" \/>\n<meta name=\"twitter:label1\" content=\"\uae00\uc4f4\uc774\" \/>\n\t<meta name=\"twitter:data1\" content=\"Kendra\" \/>\n\t<meta name=\"twitter:label2\" content=\"\uc608\uc0c1 \ub418\ub294 \ud310\ub3c5 \uc2dc\uac04\" \/>\n\t<meta name=\"twitter:data2\" content=\"7\ubd84\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/#article\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/\"},\"author\":{\"name\":\"Kendra\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#\\\/schema\\\/person\\\/ab995dee3add775a36e64cdc07368e83\"},\"headline\":\"Monitoring and Characterization of Atomic Layer Deposition Processes with Semicon Process Solutions\",\"datePublished\":\"2021-11-17T19:56:49+00:00\",\"dateModified\":\"2024-08-09T12:55:03+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/\"},\"wordCount\":1210,\"publisher\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#organization\"},\"image\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/www.tofwerk.com\\\/wp-content\\\/uploads\\\/Atomic-Layer-Deposition-App-Note-2.jpg\",\"articleSection\":[\"Application Notes\"],\"inLanguage\":\"ko-KR\"},{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/\",\"url\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/\",\"name\":\"Monitoring and Characterization of Atomic Layer Deposition Processes\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/#primaryimage\"},\"image\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/www.tofwerk.com\\\/wp-content\\\/uploads\\\/Atomic-Layer-Deposition-App-Note-2.jpg\",\"datePublished\":\"2021-11-17T19:56:49+00:00\",\"dateModified\":\"2024-08-09T12:55:03+00:00\",\"description\":\"Incorporating ClearFab Process Solutions within an atomic layer deposition system allows for simultaneous, real-time detection of all ionized molecules and fragments.\",\"breadcrumb\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/#breadcrumb\"},\"inLanguage\":\"ko-KR\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"ko-KR\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/#primaryimage\",\"url\":\"https:\\\/\\\/www.tofwerk.com\\\/wp-content\\\/uploads\\\/Atomic-Layer-Deposition-App-Note-2.jpg\",\"contentUrl\":\"https:\\\/\\\/www.tofwerk.com\\\/wp-content\\\/uploads\\\/Atomic-Layer-Deposition-App-Note-2.jpg\",\"width\":1200,\"height\":630},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/monitoring-atomic-layer-deposition-processes\\\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\\\/\\\/www.tofwerk.com\\\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Monitoring and Characterization of Atomic Layer Deposition Processes with Semicon Process Solutions\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#website\",\"url\":\"https:\\\/\\\/www.tofwerk.com\\\/\",\"name\":\"TOFWERK\",\"description\":\"Bringing time-of-flight mass spectrometry to new markets\",\"publisher\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\\\/\\\/www.tofwerk.com\\\/?s={search_term_string}\"},\"query-input\":{\"@type\":\"PropertyValueSpecification\",\"valueRequired\":true,\"valueName\":\"search_term_string\"}}],\"inLanguage\":\"ko-KR\"},{\"@type\":\"Organization\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#organization\",\"name\":\"TOFWERK\",\"url\":\"https:\\\/\\\/www.tofwerk.com\\\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"ko-KR\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#\\\/schema\\\/logo\\\/image\\\/\",\"url\":\"https:\\\/\\\/www.tofwerk.com\\\/wp-content\\\/uploads\\\/2020\\\/08\\\/TOFWERK_logo-square.png\",\"contentUrl\":\"https:\\\/\\\/www.tofwerk.com\\\/wp-content\\\/uploads\\\/2020\\\/08\\\/TOFWERK_logo-square.png\",\"width\":500,\"height\":500,\"caption\":\"TOFWERK\"},\"image\":{\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#\\\/schema\\\/logo\\\/image\\\/\"},\"sameAs\":[\"https:\\\/\\\/www.facebook.com\\\/Tofwerk-AG-132696640122705\\\/\",\"https:\\\/\\\/x.com\\\/tofwerker\",\"https:\\\/\\\/www.linkedin.com\\\/company\\\/tofwerk\"]},{\"@type\":\"Person\",\"@id\":\"https:\\\/\\\/www.tofwerk.com\\\/#\\\/schema\\\/person\\\/ab995dee3add775a36e64cdc07368e83\",\"name\":\"Kendra\",\"image\":{\"@type\":\"ImageObject\",\"inLanguage\":\"ko-KR\",\"@id\":\"https:\\\/\\\/secure.gravatar.com\\\/avatar\\\/7fdc609b8dd7683541547247c806623238bd3f9b17ed3dfda3c8465f0480a984?s=96&d=mm&r=g\",\"url\":\"https:\\\/\\\/secure.gravatar.com\\\/avatar\\\/7fdc609b8dd7683541547247c806623238bd3f9b17ed3dfda3c8465f0480a984?s=96&d=mm&r=g\",\"contentUrl\":\"https:\\\/\\\/secure.gravatar.com\\\/avatar\\\/7fdc609b8dd7683541547247c806623238bd3f9b17ed3dfda3c8465f0480a984?s=96&d=mm&r=g\",\"caption\":\"Kendra\"}}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"\uc6d0\uc790\uce35 \uc99d\ucc29 \uacf5\uc815\uc758 \ubaa8\ub2c8\ud130\ub9c1 \ubc0f \ud2b9\uc131\ud654","description":"\uc6d0\uc790\uce35 \uc99d\ucc29 \uc2dc\uc2a4\ud15c \ub0b4\uc5d0 ClearFab \uacf5\uc815 \uc194\ub8e8\uc158\uc744 \ud1b5\ud569\ud558\uba74 \ubaa8\ub4e0 \uc774\uc628\ud654\ub41c \ubd84\uc790\uc640 \uc870\uac01\uc744 \uc2e4\uc2dc\uac04\uc73c\ub85c \ub3d9\uc2dc\uc5d0 \uac10\uc9c0\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/www.tofwerk.com\/ko\/monitoring-atomic-layer-deposition-processes\/","og_locale":"ko_KR","og_type":"article","og_title":"Monitoring and Characterization of Atomic Layer Deposition Processes","og_description":"Incorporating ClearFab Process Solutions within an atomic layer deposition system allows for simultaneous, real-time detection of all ionized molecules and fragments.","og_url":"https:\/\/www.tofwerk.com\/ko\/monitoring-atomic-layer-deposition-processes\/","og_site_name":"TOFWERK","article_publisher":"https:\/\/www.facebook.com\/Tofwerk-AG-132696640122705\/","article_published_time":"2021-11-17T19:56:49+00:00","article_modified_time":"2024-08-09T12:55:03+00:00","og_image":[{"width":1200,"height":630,"url":"https:\/\/www.tofwerk.com\/wp-content\/uploads\/Atomic-Layer-Deposition-App-Note-2.jpg","type":"image\/jpeg"}],"author":"Kendra","twitter_card":"summary_large_image","twitter_creator":"@tofwerker","twitter_site":"@tofwerker","twitter_misc":{"\uae00\uc4f4\uc774":"Kendra","\uc608\uc0c1 \ub418\ub294 \ud310\ub3c5 \uc2dc\uac04":"7\ubd84"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"Article","@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/#article","isPartOf":{"@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/"},"author":{"name":"Kendra","@id":"https:\/\/www.tofwerk.com\/#\/schema\/person\/ab995dee3add775a36e64cdc07368e83"},"headline":"Monitoring and Characterization of Atomic Layer Deposition Processes with Semicon Process Solutions","datePublished":"2021-11-17T19:56:49+00:00","dateModified":"2024-08-09T12:55:03+00:00","mainEntityOfPage":{"@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/"},"wordCount":1210,"publisher":{"@id":"https:\/\/www.tofwerk.com\/#organization"},"image":{"@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/#primaryimage"},"thumbnailUrl":"https:\/\/www.tofwerk.com\/wp-content\/uploads\/Atomic-Layer-Deposition-App-Note-2.jpg","articleSection":["Application Notes"],"inLanguage":"ko-KR"},{"@type":"WebPage","@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/","url":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/","name":"\uc6d0\uc790\uce35 \uc99d\ucc29 \uacf5\uc815\uc758 \ubaa8\ub2c8\ud130\ub9c1 \ubc0f \ud2b9\uc131\ud654","isPartOf":{"@id":"https:\/\/www.tofwerk.com\/#website"},"primaryImageOfPage":{"@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/#primaryimage"},"image":{"@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/#primaryimage"},"thumbnailUrl":"https:\/\/www.tofwerk.com\/wp-content\/uploads\/Atomic-Layer-Deposition-App-Note-2.jpg","datePublished":"2021-11-17T19:56:49+00:00","dateModified":"2024-08-09T12:55:03+00:00","description":"\uc6d0\uc790\uce35 \uc99d\ucc29 \uc2dc\uc2a4\ud15c \ub0b4\uc5d0 ClearFab \uacf5\uc815 \uc194\ub8e8\uc158\uc744 \ud1b5\ud569\ud558\uba74 \ubaa8\ub4e0 \uc774\uc628\ud654\ub41c \ubd84\uc790\uc640 \uc870\uac01\uc744 \uc2e4\uc2dc\uac04\uc73c\ub85c \ub3d9\uc2dc\uc5d0 \uac10\uc9c0\ud560 \uc218 \uc788\uc2b5\ub2c8\ub2e4.","breadcrumb":{"@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/#breadcrumb"},"inLanguage":"ko-KR","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/"]}]},{"@type":"ImageObject","inLanguage":"ko-KR","@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/#primaryimage","url":"https:\/\/www.tofwerk.com\/wp-content\/uploads\/Atomic-Layer-Deposition-App-Note-2.jpg","contentUrl":"https:\/\/www.tofwerk.com\/wp-content\/uploads\/Atomic-Layer-Deposition-App-Note-2.jpg","width":1200,"height":630},{"@type":"BreadcrumbList","@id":"https:\/\/www.tofwerk.com\/monitoring-atomic-layer-deposition-processes\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.tofwerk.com\/"},{"@type":"ListItem","position":2,"name":"Monitoring and Characterization of Atomic Layer Deposition Processes with Semicon Process Solutions"}]},{"@type":"WebSite","@id":"https:\/\/www.tofwerk.com\/#website","url":"https:\/\/www.tofwerk.com\/","name":"TOFWERK","description":"\uc0c8\ub85c\uc6b4 \uc2dc\uc7a5\uc5d0 \ube44\ud589 \uc2dc\uac04 \uc9c8\ub7c9 \ubd84\uc11d\ubc95 \ub3c4\uc785","publisher":{"@id":"https:\/\/www.tofwerk.com\/#organization"},"potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.tofwerk.com\/?s={search_term_string}"},"query-input":{"@type":"PropertyValueSpecification","valueRequired":true,"valueName":"search_term_string"}}],"inLanguage":"ko-KR"},{"@type":"Organization","@id":"https:\/\/www.tofwerk.com\/#organization","name":"TOFWERK","url":"https:\/\/www.tofwerk.com\/","logo":{"@type":"ImageObject","inLanguage":"ko-KR","@id":"https:\/\/www.tofwerk.com\/#\/schema\/logo\/image\/","url":"https:\/\/www.tofwerk.com\/wp-content\/uploads\/2020\/08\/TOFWERK_logo-square.png","contentUrl":"https:\/\/www.tofwerk.com\/wp-content\/uploads\/2020\/08\/TOFWERK_logo-square.png","width":500,"height":500,"caption":"TOFWERK"},"image":{"@id":"https:\/\/www.tofwerk.com\/#\/schema\/logo\/image\/"},"sameAs":["https:\/\/www.facebook.com\/Tofwerk-AG-132696640122705\/","https:\/\/x.com\/tofwerker","https:\/\/www.linkedin.com\/company\/tofwerk"]},{"@type":"Person","@id":"https:\/\/www.tofwerk.com\/#\/schema\/person\/ab995dee3add775a36e64cdc07368e83","name":"Kendra","image":{"@type":"ImageObject","inLanguage":"ko-KR","@id":"https:\/\/secure.gravatar.com\/avatar\/7fdc609b8dd7683541547247c806623238bd3f9b17ed3dfda3c8465f0480a984?s=96&d=mm&r=g","url":"https:\/\/secure.gravatar.com\/avatar\/7fdc609b8dd7683541547247c806623238bd3f9b17ed3dfda3c8465f0480a984?s=96&d=mm&r=g","contentUrl":"https:\/\/secure.gravatar.com\/avatar\/7fdc609b8dd7683541547247c806623238bd3f9b17ed3dfda3c8465f0480a984?s=96&d=mm&r=g","caption":"Kendra"}}]}},"_links":{"self":[{"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/posts\/27557","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/users\/3"}],"replies":[{"embeddable":true,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/comments?post=27557"}],"version-history":[{"count":9,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/posts\/27557\/revisions"}],"predecessor-version":[{"id":48001,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/posts\/27557\/revisions\/48001"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/media\/27576"}],"wp:attachment":[{"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/media?parent=27557"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/categories?post=27557"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/tags?post=27557"},{"taxonomy":"product_notes","embeddable":true,"href":"https:\/\/www.tofwerk.com\/ko\/wp-json\/wp\/v2\/product_notes?post=27557"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}