Complete AMC Control
Comprehensive, fast and sensitive AMC monitoring.
Ultra-Fast and Ultra-Sensitive,
Real-Time AMC Monitoring
Monitor known and emerging contaminants from diverse molecular categories, sensitively, accurately, and reliably.
Conventional AMC monitoring solutions often require multiple sensors to adequately measure a full list of compounds requiring monitoring. The TOFWERK Semicon AMC Monitor provides robust and simultaneous measurements of multiple AMC categories, with a single solution.
Real-time Measurements
Quickly detect and react to early stage contamination events.
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Robust Coverage
Ultrafast, simultaneous measurements of AMCs including acids, bases, condensable and VOCs.
Single digit, part-per-trillion LODs
Sensitive detection for the lowest concentrations.
| AMC | CAS | Molecule | 2s LOD (ppbv) | 1min LOD (ppbv) |
|---|---|---|---|---|
| Propylene glycol methyl ether acetate (PGMEA) | 108-65-6 | C6H12O3 | 0.0065 | 0.0012 |
| Propylene glycol methyl ether (PGME) | 107-98-2 | C4H10O2 | 0.052 | 0.0094 |
| Methyl Ethyl Ketone (MEK) | 78-93-3 | C4H8O | 0.421 | 0.075 |
| Ethyl Acetate (EA) | 141-78-6 | C4H8O2 | 0.104 | 0.019 |
| Cyclopentane | 287-92-3 | C5H10 | 0.132 | 0.023 |
| Acetone | 67-64-1 | C3H6O | 0.002 | 0.0009 |
| Toluene | 108-88-3 | C7H8 | 0.012 | 0.003 |
| Ammonia | 7664-41-7 | NH3 | 0.408 | 0.072 |
| Hydrogen fluoride | 7664-39-3 | HF | 0.011 | 0.0002 |
| Hydrochloric acid | 132228-87-6 | HCl | 0.526 | 0.095 |
| Nitric acid | 7697-37-2 | HNO3 | 0.0072 | 0.0013 |
| Chlorine | 7782-50-5 | Cl2 | 0.001 | 0.0002 |
Comprehensive contamination control throughout the fab.
FOUP Monitoring
The transport of Front Opening Unified Pods from process to process presents one of the greatest contamination risks in the fab. FOUP cleaning is limited by the sensitivity, speed and coverage of AMC screening.
Facility Monitoring
Semiconductor manufacturing consists of many independent processes. To catch early-stage contamination events, sensitive AMC monitoring is a critical component of fab infrastructure.
Mobile Analysis
Semicon AMC Monitors offer unique versatility allowing easy deployment in the different fab environments. Semicon AMC Monitors provide in-situ mobile measurement for accurate AMC control and leak detection of specific important for sticky and reactive contaminants.
Immediate Hazard Detection
Material off-gassing in an ISO 5 microtechnology cleanroom.
Material was purged with CDA and measured directly. Each time series shows simultaneous compound measurements with 3 different ionization chemistries.
Proud Members
The TOFWERK Semicon Team takes great pride in its membership with organizations dedicated to advancing the electronic and semiconductor industries through networking and scientific knowledge sharing.
Our Expert Partners
Our carefully selected partners share our core mission to provide material purity and contaminant-free environments within the semiconductor industry. Through collaborative efforts, we strive to empower our customers in producing top-tier products while minimizing manufacturing yield loss.
