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Semicon Process Solutions provide sensitive real-time analysis of semiconductor processes
Process analyzers for semiconductor R&D and production environments in etch, deposition and lithography processes
Overview
Specifications
Resources
Publications
Overview
Process Monitoring and Control
Semicon Process Solutions are fully integrated process characterization and monitoring systems. Using electron ionization time-of-flight mass spectrometry, all precursors, byproducts, and trace species are simultaneously detected to guide immediate process control action and to inform analytics and process intelligence for deposition, etch, and lithography.
Uniquely positioned to address challenging process requirements, Semicon Process Solutions provide fast, non-intrusive detection of process deviations, in real time.
- Ready for diverse semiconductor applications
Reactor health state (RHS) monitoring, end-point detection, plasma diagnostics and process optimization - Fast and sensitive mass spectrometric monitoring
TOF mass analyzer enables real-time monitoring all process species with isotopic mass resolution at sub-second refresh rates - Large dynamic range
Simultaneous detection of all precursors, byproducts and trace species in semiconductor processes - Robust and mobile
Rugged, flexible configuration allows precision in harsh environments and portability for non-invasive detection - Long-term stability
Accurate and reproducible response - Powerful software
Simple control interface with a fully documented API for system integration - Background reduction with notch filter technology
Attenuate specific abundant species to control mass spectral interferences
Specifications
Semicon Process Configurations and Specifications
Semicon Process Analyzers are available in three different configurations. Accessories can be selected to address specific fab applications.
Process Gas Analysis Option
Solution configuration best suited for the analysis and monitoring of neutral species present in semiconductor processes with ppm sensitivity and millisecond sampling rates.
Process Ion Analysis Option
Solution configuration for the analysis and monitoring of ionic and neutral species present in semiconductor processes with ppm sensitivity and millisecond sampling rates.
Process Ion Energy Analysis Option
Solution configuration for the simultaneous analysis of the ionic species, mass, and energy in semiconductor processes with better than 0.5 eV energy and 10 microseconds time resolution, ppm sensitivity, and millisecond sampling rates.
Accessories
- Multiport Valve for cluster applications or similar
- Inlet manifold allowing measurements at different process pressure ranges
Dynamic range and Limits of detections
- > 5 orders of magnitude of dynamic range
- Better than ppm sensitivity for most elements @ 1 kHz acquisition rate
System Specifications
| Mass Resolving Power | From 800 to 8000 Th/Th |
| Mass Range | 1000 Th |
| Mass Accuracy | Down to 5 ppm |
| Dynamic Range | > 105 |
| Max Spectra Rate/TOF Extraction Rate | 1 kHz/> 30 kHz |
| Corrosion Resistant | Yes |
Resources
- Monitoring and Characterization of Atomic Layer Deposition Processes with Semicon Process Solutions
- Real-Time Insight into Spontaneous and Plasma Enhanced Si Etching Processes with Semcion Process Solutions
- TOFWERK Process Analyzer Supports Characterization of InN Thin Films Using MAR-HiPIMS
- How are Thin Films Microstructures Affected by HiPIMS Deposition Parameters?
- Study Demonstrates Real-Time Detection of All ALD Process Species with In Situ pgaTOF
Product Information
Publications
Semicon Process Solution Publications
2023
- Hain et al. Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation. Surface and Coatings Technology, 2023. In Focus | DOI: 10.1016/j.surfcoat.2022.129188
2022
- Lapeyre et al. Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films. Surface and Coatings Technology, 2022. In Focus | DOI: 10.1016/j.surfcoat.2022.129002
- Priebe et al. Real-Time In Situ Parallel Detection of Elements and Molecules with TOFMS during ALD for Chemical Quality Control of Thin Films. The Journal of Physical Chemistry, 2022. In Focus | DOI: 10.1021/acs.jpcc.1c09544
The TOFWERK Semicon team is a proud member of the SEMI association. This industry group unites the entire electronics manufacturing and design supply chain through programs, member initiatives, market research, and advocacy.
