Complete Process Control
Process analyzers for R&D and production environments in etch, deposition and lithography processes.
Semicon Process Publications
2024
- Watzek et. al- Energy-Resolving Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis. J. Am. Soc. Mass Spectrom., 2024. In Focus | DOI: 10.1021/jasms.4c00140
- Hain et al. Nanostructure and Optical Property Tailoring of Zinc Tin Nitride Thin Films through Phenomenological Decoupling: A Pathway to Enhanced Control. ACS Appl. Nano Mater, 2024. In Focus | DOI: 10.1021/acsanm.3c06178
2023
- Hain et al. Nanostructure and Optical Property Tailoring of Zinc Tin Nitride Thin Films through Phenomenological Decoupling: A Pathway to Enhanced Control. ACS Appl. Nano Mater, 2024. In Focus | DOI: 10.1021/acsanm.3c06178
2022
- Lapeyre et al. Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films. Surface and Coatings Technology, 2022. In Focus | DOI: 10.1016/j.surfcoat.2022.129002
- Priebe et al. Real-Time In Situ Parallel Detection of Elements and Molecules with TOFMS during ALD for Chemical Quality Control of Thin Films. The Journal of Physical Chemistry, 2022. In Focus |Â DOI: 10.1021/acs.jpcc.1c09544
- Lapeyre et al. Deposition and characterisation of c-axis oriented AlScN thin films via microwave plasma-assisted reactive HiPIMS. Surface and Coatings Technology, 2022. DOI: 10.1016/j.surfcoat.2023.129540
