
TOFWERK Process Analyzer Supports Characterization of InN Thin Films Using MAR-HiPIMS
Hain et al.Surface & Coatings TechnologyDOI: 10.1016/j.surfcoat.2022.129188 Microwave Plasma-Assisted Reactive HiPIMS of InN Films: Plasma Environment and Material Characterization A scientific collaboration between Bern University